OPEN NEW HORIZONS WITH OUR NANOFABRICATOR™

Join our pilot programme

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Why should you join?

Building micro and nanodevices with Nanofabricator™

With our technology micro and nanodevices can be printed and tested in days instead of months or years.

Our proprietary Nanofabricator™ prints micro and nanodevices at an atomic scale. We use gas materials to create test ready devices, within hours, depending on the complexity of your solution. Nanofabricator’s patent-pending technology from ATLANT 3D Nanosystems redefines value chains for innovative micro and nanosystems design, prototyping, production cycles, quality control, and processing speed.

Our new value chain

We are passionate about providing solutions to inventors at an atomic scale. Our goal is to support you with our know-how and expertise, each step of the way.

Microdevice design optimized for 3D printing

Gas phase materials available from dozens of suppliers

Hyper evolving standalone or modular Nanofabricator™

Applications in the biomedical field, military, aerospace, IoT, mobiles, communication, and computing

The Nanofabricator™ is designed based on the state-of-the-art microreactor SADALP™ (Selective Area Direct Atomic Layer Processing/Printing) technology developed by our team. It allows for highly conformal, low-temperature deposition and removal of material on a surface with atomic precision and material versatility. The SADALP™ process works with reactive gases that create self-controlled surface chemical reactions, repeated in cycles, and allows selected patterns and structure creation directly within selected areas.

Our pilot programme will benefit you in

We are passionate about providing solutions to scientists and engineers who are looking for innovation at an atomic scale. Our goal is to support you with our know-how and expertise at each step of the way.

Proof of concept

Short-term project to validate your R&D or engineering challenges and design concepts

Proof of technology

Mid-term project dedicated to testing our technology to fit your technical requirements

R&D Prototyping

Customised project for your needs to gain the freedom to experiment with our technology and know-how, to test and develop new engineering and scientific solutions

And beyond

We are open to hearing your challenges and bright ideas, and we are here to support you at any stage

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Capabilities of the Nanofabricator prototype system

Faster design iterations and optimization

Real time process monitoring, quality control, and device inspection

Sensors and analytics-driven process control

Current first prototype capabilities

Resolution

- Lateral precision: 350 - 500 micron
- Transverse precision: 1 atomic layer

Multimaterial stack printing

- Combination of TiO2 and Pt
- Simultaneous combination of several materials  and creation cross geometries

Selective printing

- Selective material: we can already combine printing with several materials for one run
- Selective area: 2D features. e.g. letters, line, cross features, and many other

Printing speed

- Lateral: 4mm/s*
- Transverse growth speed: up to 100 nm/min**

*Lateral speeds on the efficiency of the translation stage and can be upgraded
**This parameter is dependent on the lateral speed, complexity and length of the features printed in one run

Process temperature

- Temperature ranges from room temperature to up to 400°C

Available
materials

- Oxides: TiO2
- Metals: Pt

Surface geometry

- Printing on highly polished Si, glass, and sapphire
- Printing on corrugated surfaces with micro and nanoscale roughness
- Printing on surfaces with a step size up to 10μm

Working ambient conditions

- Atmospheric pressure and localised controlled inert ambient

Our future technology capabilities

Versatile material selection, custom- designed for atomic layer printing

- Commercially available from dozens of suppliers
- Commonly used group: oxide, metal, nitrides, semiconductor, and organic composition – with over 450 available materials (See more material here)
- Possible to cover the needs of a more substantial amount of industrial applications

Additive & subtractive processing

- Allows to pre-clean the surfaces before processing
- Deposit various materials on different substrate morphology
- Create 2D and 3D structures
- Allows removing materials with atomic layer precision
- Form subtracted patterns and 3D structures
- In house material characterisation

Conformal deposition

- Single materials
- Multi-material with single-atom precision
- Combination of different groups of materials

Low and high temperatures modes for:

- Tuning material properties
- Print on temperature-sensitive substrates
- High-temperature dependant materials with up to 400°C

Surface geometry and materials

- A highly polished substrate with a small or large area
- Banded, curved, and highly corrugated
- Any commercially available dielectric, metal- semiconductor and plastic materials*
*Material limited due to temperature requirements

Selective processing

- Creation of simple and complex geometric patterns and combinations, 2D and 3D structures
- Combination of a variety of different materials and instant switching to enable multi-material processing
- Processing multi-level layers and patterns

Ask us for the latest updates on our
technology development

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We are members of

SEMI

GSA

dansk am hub

EPIC

dansk indusri

inam

ivam

Technical University of Denmark

ATLANT 3D Nanosystems

Diplomvej 378
2800 Kongens Lyngby
Denmark

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