Find out what endless possibilities feel like with our products and services. Our solution is a multidisciplinary and revolutionary technology that enables multi-material, atomically precise, highly scalable atomic layer advanced manufacturing for rapid prototyping and manufacturing of micro and nanodevices.

NanofabricatorTM 1

ACADEMIC & INDUSTRIAL R&D

The material innovation and prototyping platform

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Sequential deposition of up to 4 materials

4 different precursors and 4 different reactants can be loaded at the same time, allowing you to quickly switch between the materials you wish to deposit or test

Samples size up to 100x100 mm

The stage of NanofabricatorTM 1 can accommodate wafers up to 4’’ and other shapes under 100x100 mm

Rapid deposition

The NanofabricatorTM 1 stage can move up to 100mm/s, with a deposition speed dependent on the sample and process specifications

NanofabricatorTM 2

INDUSTRIAL R&D

The extended material innovation and small batch prototyping platform

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Sequential deposition of up to 6 materials

6 different precursors and 6 different reactants can be loaded at the same time, allowing you to quickly switch between the materials you wish to deposit or test

Samples size up to 150x150 mm / 300x300 mm

The stage of NanofabricatorTM 2 can accommodate wafers up to 6’’ / 12’’ and other shapes under 150x150 mm / 300x300 mm

Rapid deposition

The NanofabricatorTM 2 stage can move up to 500mm/s, with a deposition speed dependent on the sample and process specifications

One technology with multi-process capacity

Microdevice R&D and prototyping

• Rapid functional devices prototyping
• Small-batch prototyping & iterating
• Direct-write technology

Material innovation and R&D

• Rapid testing of new materials
• Material characterization
• Quality evaluation of materials
• Developing  material compounds

Integration of microdevices

Added functionalities on microdevices, such as: Integrated sensors, Surface texturing, Selective area protective coating, Selective area optical coating, Chip surgeryping & iterating, Direct-write technology

Welcome to our lab to test NanofabricatorTM 2

Current capabilities

Line Width

400 µm now,  25 µm in development, 1 µm long term goal

Multimaterial stack printing

Multiple materials can be deposited sequentially

Selective Area Deposition

Path defined processing

Printing speed

Variable from 0.1 mm/s up to 100 mm/s (Based on sample and process specifications)

Crystalline Material Growth

High quality material deposition

Selective doping

Selective surface doping possible

Temperature

RT – 300°C

Versatile Materials Platform

Possible to process several materials sequentially out of 150* possible

Surface geometry

Conformal deposition on any type of surface with corrugation up to 25 µm

Environment

Atmospheric or controlled ambient

Selective nanoparticle deposition

Tested on Pt process

Hollow microstructuring

Post process hollow structure development

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