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Our solution is a revolutionary technology that enables selective area direct atomic layer processing for rapid advanced materials R&D and prototyping of microdevices.
The Nanofabricator LiteTM enables the pattern deposition of materials at atmospheric and inert ambient conditions in just one step. Thanks to its reduced form factor, Nanofabricator Lite can be installed in different configurations to fit your needs:
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Ultra-compact design enables the Nanofabricator Lite placement in a glovebox, fume hood, or other controlled environments for testing potentially hazardous materials and processes. Standard connections enable the Nanofabricator Lite to be easily installed without expensive infrastructure investments.
Proprietary micronozzle currently enables selective area processing and patterning with printing lateral resolution of 400 µm, with atomic layer vertical resolution (0.1 nm, material-dependent).
Sensors & automatic tilting available as optional modules for better process control and alignment.
Sample size: up to 50x50 mm**
Patterning on flat and corrugated surfaces with corrugation up to 20 µm, as well as porous and delicate surfaces like membranes. Curved surfaces are supported if a corresponding custom micronozzle is used.*
Broad surface material compatibility based on the recipe parameters. Supported materials include Silicon, Borosilicate, and Fused Glass, and high-temperature polymers.
Lateral printing speed up to 10 mm/s **
Material-versatile platform for thermal ALD compatible chemical processesTemperature range: uniform sample heating from room temperature to 300C +/- 5C
User-friendly: Fully automated control system and recipe editor
Replaceable micronozzles will enable further lateral resolution improvements and possibility for free from contamination process.